于丰源论文题目：硅微通道电化学微加工等径控制技术研究

研究内容

1. 等径控制原理及影响因素研究；

2. 等径控制实验技术研究；

3. 电化学微加工系统优化；

4. 通道形貌表征及研究。

参考文献

[1] P Narayanan. Photoelectrochemical Etching of Isolated, High Aspect Ratio Microstructures in n-Type Silicon (100) (MsD). Louisiana State University, 2011.
[2] 张光辉, 孔令峰, 潘倩 and 黎学明. 电化学阳极氧化条件对阵列多孔硅的影响. 功能材料, 2009, 40(6):966-969.
[3] E K Ossei-Wusu, A Cojocaru, J Carstensen, M Leisner and H Foll. Etching Deep Macropores in n-Type Silicon in Short Times. in Proceeding of 214th ECS Meeting, 2008.
[4] D N Pagonis and A G Nassiopoulou. Formation of confined macroporous silicon membranes on pre-defined areas on the Si substrate. Physica Status Solidi (a), 2007, 204(5):1335-1339.
[5] G X Zhang. Porous Silicon: Morphology and Formation Mechanisms. MODERN ASPECTS OF ELECTROCHEMISTRY, 2006, 39:65-133.
[6] F Lu. A brief overview of porous silicon, Duke University, Duke University, 2006.
[7] Y Tao and M Esashi. Local formation of macroporous silicon through a mask. Journal of Micromechanics and Microengineering, 2004, 14(10):1411-1415.
[8] J G Velasco. A theoretical interpretation of surface diffusion processes at electrode-electrolyte interfaces. JOURNAL OF NEW MATERIALS FOR ELECTROCHEMICAL SYSTEMS, 2000, 3(2):147-152.
[9] S Schweizer, R B Wehrspohn and J Schilling. Improved electrochemical etching of macroporous silicon - the role of surfactants. 2000,