樊书晓论文题目：金属粒子催化腐蚀硅的机理研究

研究内容

1. 硅的金属粒子催化腐蚀机理；

2. 硅纳米线及其它微结构制备实验研究；

3. 形貌表征及性能研究；

4. 金属催化腐蚀的模拟仿真研究。

参考文献

[1] 吕文辉 and 张帅. 金属援助硅化学刻蚀法可控制备硅纳米线阵列. 半导体光电, 2011, 32(3):363-365.
[2] R M El-Sherif, S A Khalil and W Badawy. Metal-assisted etching of p-silicon--Pore formation and characterization. Journal of Alloys and Compounds, 2011, 509(10):4122-4126.
[3] Z Huang, N Geyer, P Werner, J de Boor and U Gosele. Metal‐Assisted Chemical Etching of Silicon: A Review. Advanced Materials, 2010, 23(2):285-308.
[4] Z Huang, N Geyer, L Liu, M Li and P Zhong. Metal-assisted electrochemical etching of silicon. Nanotechnology, 2010, 21(46):465301.
[5] S Ono, F Arai and H Asoh. Micro-Patterning of Semiconductors by Metal-Assisted Chemical Etching through Self-Assembled Colloidal Spheres. in Electrochemical society, 2009, 901:917.
[6] C Chartier, S Bastide and C Lévy-Clément. Metal-assisted chemical etching of silicon in HF-H2O2. Electrochimica Acta, 2008, 53(17):5509-5516.